This article is cited in 15 papers

Electrophysics

Factors determining the efficiency of magnetron sputtering. Optimization criteria

A. V. Rogov^a, Yu. V. Kapustin^a, Yu. V. Martynenko<sup>ab

a</sup> National Research Centre "Kurchatov Institute", Moscow
^b National Engineering Physics Institute "MEPhI", Moscow

Abstract: We report on the results of experimental study of the dependence of sputtering energy efficiency $K_w$ in a dc planar magnetron sputtering setup on the discharge power, working gas pressure, magnetic field, cathode erosion depth, and the structure of the gas puffing system and anode. We propose that this parameter be used for comparing the degree of perfection of the magnetron design irrespective of the magnetron size and structural features. The results of measurements of $K_w$ in sputtering of Al, Ti, Cr, Cu, Zn, Zr, Nb, Mo, Ag, In, Sn, Ta, W, Pt, and Au are considered. The optimization criterion is worked out for the magnetic system of the magnetron, which ensures the minimal working pressure and the maximal sputtering rate for the cathode. The results are analyzed theoretically.

Received: 27.06.2014

 English version: Technical Physics, 2015, 60:2, 283–291

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