Abstract:
The results of the study on amorphous hydrogenated carbon (a-C:H) films obtained by magnetron sputtering are presented. The influence of ion-plasma discharge power on the formation of the local structure of a-C:H films was investigated using Raman scattering spectroscopy. The paper demonstrates how the synthesis conditions affect the $sp^2/sp^3$ bond ratio in the formation of the a-C:H film structure and, as a result, the change in their optical properties. The optical band gap values for a-C:H films synthesized at different discharge power levels were calculated. It was found that increasing the ion-plasma discharge power from 12 to 18 W leads to a decrease in the optical band gap from 1.8 to 1.43 eV.