Reduction of boron oxide on polycrystalline Al and Sm substrates

Lev A. Akashev^a, Yulia V. Korkh^b, Nikolai A. Popov^a, Tatiana V. Kuznetsova^b, Alla V. Konyukova^a, V.ladimir G. Shevchenko<sup>a

a</sup> Institute of Solid State Chemistry UB RAS, Ekaterinburg, Russian Federation
^b M. N. Mikheev Institute of Metal Physics of the UB RAS, Ekaterinburg, Russian Federation

Abstract: This paper investigates the reduction of boron oxide deposited by vacuum thermal evaporation on aluminum and samarium surfaces using optical methods of Raman spectroscopy (RS) and spectral ellipsometry. Raman peaks corresponding to vibrations of $\beta$-rhombohedral boron ($\beta$-B).were detected in the spectra of these samples. Spectral ellipsometry was used to determine the optical constants and thickness of the nanoscale boron film in the spectral range from 270 nm to 1000 nm.

Keywords: thin film ellipsometry, Cauchy formula, boron oxide reduction.

UDC: 544.032, 53.081.7

Received: 10.07.2025
Received in revised form: 24.08.2025
Accepted: 27.09.2025

Language: English