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Ultra-hard AlMgB$_{14}$ coatings fabricated by RF magnetron sputtering from a stoichiometric target

A. M. Grishin^abc, S. I. Khartsev^a, J. Bohlmark^b, M. Ahlgren<sup>b

a</sup> Petrozavodsk State University
^b AB Sandvik Coromant
^c KTH Royal Institute of Technology

Abstract: For the first time hard aluminium magnesium boride films were fabricated by RF magnetron sputtering from a single stoichiometric ceramic AlMgB$_{14}$ target. Optimized processing conditions (substrate temperature, target sputtering power and target-to-substrate distance) enable fabrication of stoichiometric in-depth compositionally homogeneous films with the peak values of nanohardness $88$ GPa and Young's modulus $517$ GPa at the penetration depth of $26$ nm and, respectively, $35$ and $275$ GPa at $200$ nm depth in $2$ $\mu$m thick film.

Received: 15.10.2014

Language: English

DOI: 10.7868/S0370274X14220160

 English version: Journal of Experimental and Theoretical Physics Letters, 2014, 100:10, 680–687

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