Abstract:
The longitudinal and transverse Nernst–Ettingshausen effects have been measured at high pressures up to $30$ GPa. The results of studying Te and Se in the region of metal-semiconductor phase transformations are presented as a demonstration of the possibilities of the given technique. In agreement with magnetoresistance data, it was found that the hole mobility grows with increasing pressure as a result of a decrease in the band gap width. Mechanisms of hole scattering at high pressures were determined.