This article is cited in 6 papers

Surface physics, thin films

Deposition of NiFe(200) and NiFe(111) textured films onto Si/SiO$_{2}$ substrates by DC magnetron sputtering

A. S. Dzhumaliev^ab, Yu. V. Nikulin^ba, Yu. A. Filimonov<sup>bac

a</sup> Saratov State University
^b Saratov Branch of the Institute of Radio Engineering and Electronics
^c Yuri Gagarin State Technical University of Saratov

Abstract: The effect of substrate temperature $T_{\operatorname{sub}}$ and bias voltage $U_{\operatorname{bias}}$ on the texture of NiFe films with thickness $d\sim$ 30–340 nm deposited by DC magnetron sputtering onto Si(111)/SiO$_2$ substrates under working gas pressure $\sim$0.2 Pa has been investigated. It has been demonstrated that films grown at room substrate temperature have the (111) texture that is refined under a negative bias voltage. The deposition of films onto a grounded ($U_{\operatorname{bias}}\sim$ 0) substrate heated to $T_{\operatorname{sub}}\sim$ 440–640 K results in the formation of textured NiFe(200) films.

Keywords: Substrate Temperature, Bias Voltage, Interplanar Distance, Heated Substrate, Negative Bias Voltage.

Received: 27.10.2015

 English version: Physics of the Solid State, 2016, 58:5, 1053–1057

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