This article is cited in 6 papers

Surface physics, thin films

Effect of bias voltage polarity of a substrate on the texture, microstructure, and magnetic properties of Ni films prepared by magnetron sputtering

A. S. Dzhumaliev^ab, Yu. V. Nikulin^ab, Yu. A. Filimonov<sup>bca

a</sup> Saratov Branch of the Institute of Radio Engineering and Electronics
^b Saratov State University
^c Yuri Gagarin State Technical University of Saratov

Abstract: The influence of the bias voltage polarity $U_s$ on microstructure, crystallographic texture and magnetic properties has been investigated for Ni films with a thickness of $\approx$ 15–420 nm, which are obtained via magnetron sputtering at a working gas pressure $P$ corresponding to the collision-deficient flight mode of atoms of the sputtered target between the target and the substrate. The Ni(111)-textured films have been shown to form at $U_{s}\approx$ -100 V, whose microstructure and magnetic parameters are almost unchanged with a thickness. In contrast, the Ni(200) films are formed at $U_{s}\approx$ +100 V, whose magnetic properties and micro-structure depend significantly on the thickness $d$ that manifests in a critical thickness $d^*\approx$ 150 nm, when the structure of the film becomes inhomogeneous in the thickness, the remagnetization loops are changed from rectangular to supercritical with the formation of the band domain structure.

Received: 27.10.2015

 English version: Physics of the Solid State, 2016, 58:6, 1247–1256

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