Abstract:
This paper reports on a thermal desorption spectroscopy study of the interaction of chemisorbed molecules of oxygen and carbon monoxide with ytterbium films of nanosized thickness formed on the surface of silicon substrates at room temperature. As follows from the results obtained, at 300 K, the CO and O$_2$ molecules reside on the film surface in chemisorbed state and do not dissociate under these conditions into atoms. The molecules decompose at high temperatures. The oxygen released in the process reacts with ytterbium and silicon to form silicate compounds, which decompose at still higher temperatures.