This article is cited in 5 papers

Surface physics, thin films

Photoemission electron microscopy of arrays of submicron nickel rods in a silicon dioxide matrix

S. Yu. Turishchev^a, E. V. Parinova^a, F. Kronast^b, R. Ovsyannikov^b, N. V. Malashchenok^c, E. A. Strel'tsov^c, D. K. Ivanov^c, A. K. Fedotov<sup>c

a</sup> Voronezh State University
^b Helmholtz-Zentrum Berlin für Materialien und Energie, Berlin, 12489, Germany
^c Belarusian State University, Minsk

Abstract: Arrays of Ni rods ($\sim$500 nm diameter) formed by the ion-track technology in combination with electrochemical deposition into a SiO$_2$ matrix on the surface of single-crystal silicon plates have been investigated using photoemission electron microscopy with high-intensity synchrotron (undulator) radiation. An analysis of the Ni $L_{2,3}$ X-ray absorption near-edge structure (XANES) spectra has demonstrated that rod-like structures in pores and connecting bridges between the rods are formed by a metallic nickel phase, which is stable to oxidation by atmospheric oxygen. No formation of intermediate compound phases (nickel silicides and oxides) is observed at the Ni/SiO$_2$ heterojunction, whereas oxidized nickel(II) species are identified on the surface of the SiO$_2$ matrix, which presumably can be attributed to nickel silicate and hydroxide compounds formed upon nickel(II) chemisorption in electrochemical deposition electrolytes.

Received: 14.03.2014

 English version: Physics of the Solid State, 2014, 56:9, 1916–1921

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