Surface physics, thin films

Electrical resistance and $1/f$ fluctuations in thin titanium films

O. V. Gerashchenko, V. A. Matveev, N. K. Pleshakov, V. Yu. Bairamukov

The Petersburg Nuclear Physics Institute, The National Research Center "Kurchatov Institute"

Abstract: The thickness of a metallic layer has been determined and the resistivity and spectral density of voltage fluctuations in thin titanium films with initial thicknesses of 5–100 nm, which were obtained by magnetron sputtering and intended for promising elements of the neutron optics, have been investigated. It has been found that a continuous metallic layer necessary for functioning is retained even in thinnest samples, and excess fluctuations of the layer resistance with the $1/f$-type spectrum are observed. It has been shown that the method of measuring film resistivity can be used as effective express-method of determining the thickness of metallic nanolayers.

Received: 16.12.2013

 English version: Physics of the Solid State, 2014, 56:7, 1438–1442

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