This article is cited in 1 paper

Surface physics, thin films

Fabrication of textured FeCo(110) and FeCo(200) films by DC magnetron sputtering

A. S. Dzhumaliev^ab, V. K. Sakharov<sup>a

a</sup> Saratov Branch, Kotel'nikov Institute of Radio-Engineering and Electronics, Russian Academy of Sciences
^b Saratov State University

Abstract: The results of study of bias voltage $U_b$ and substrate temperature $T_s$ influence on the texture of FeCo films with the thickness of 180 nm deposited on Si/SiO$_2$ substrates by DC magnetron sputtering are presented. It is shown that the change of $U_b$ from -250 V to 80 V leads to the growth of films with (110) texture. Further change of $U_b$ from 80 V to 250 V causes the growth of films having (200) texture. Films deposited at $U_b$ = 0 and $T_s$ = 60–300$^\circ$C have (200) texture. Further increase of $T_s$ results in the change of film texture to (110).

Keywords: FeCo films, magnetron sputtering, texture, coercitivity.

Received: 20.10.2021
Revised: 20.10.2021
Accepted: 25.10.2021

DOI: 10.21883/FTT.2022.02.51940.222

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