International Conference PhysicA.SPb/2023

Optimization of metal-induced laser-stimulated crystallization of silicon films on a flexible substrate by varying the thickness of the aluminum layer

L. D. Volkovoynova, A. A. Serdobintsev

Saratov State University, Saratov, Russia

Abstract: The influence of the thickness of the aluminum layer on the degree of silicon crystallization after irradiation of a thin-film Al/Si structure on a flexible polyimide substrate by pulsed infrared laser radiation is studied.

Keywords: crystallization of amorphous silicon, metal-induced crystallization, laser-stimulated crystallization, infrared laser radiation, flexible electronics.

Received: 16.05.2023
Revised: 05.09.2023
Accepted: 30.10.2023

DOI: 10.61011/FTT.2023.12.56753.5004k

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