International Conference PhysicA.SPb/2023

Formation of a light-scattering microrelief during atomic-layer deposition of a dielectric layer on a nanostructured film of indium-tin oxide

V. V. Acsenova^a, I. P. Smirnova^a, L. K. Markov^a, A. S. Pavluchenko^a, D. S. Kolokolov^b, M. V. Mesh<sup>b

a</sup> Ioffe Institute, St. Petersburg, Russia
^b Koltsov's Engineering and Design Bureau Corporation, St. Petersburg, Russia

Abstract: This paper presents a method for creating a light-scattering relief at the stage of formation of the lower dielectric layer of electroluminescent displays. To study the process of formation of a light-scattering relief, films with different thicknesses of the Al$_2$O$_3$ layer were fabricated, SEM images of cross-sections of the formed films were taken, and the luminous intensity angular distribution of scattered light were measured. It is demonstrated that the relief obtained at the dielectric boundary creates a light-scattering structure that improves the light extraction efficiency from the active layer of an electroluminescent display.

Keywords: nanostructured ITO, light scattering relief, light extraction efficiency.

Received: 12.05.2023
Revised: 07.09.2023
Accepted: 30.10.2023

DOI: 10.61011/FTT.2023.12.56745.5093k

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