RUS  ENG
Full version
JOURNALS // Computer Optics // Archive

Computer Optics, 2016 Volume 40, Issue 2, Pages 215–224 (Mi co135)

This article is cited in 2 papers

OPTO-IT

Characterization of the surface relief of film diffractive optical elements

T. P. Kaminskaya, V. V. Popov, A. M. Saletskiy

Lomonosov Moscow State University, Moscow, Russia

Abstract: The surface relief of film reflective diffractive optical elements (DOE) has been characterized by atomic force microscopy. The elements under study were fabricated using a variety of microfabrication techniques: traditional laser recoding of reflection rainbow holograms, Dot matrix and Kinemax technologies, and e-beam lithography. The influence of these technologies on the relief characteristics has been estimated. It has been shown that the choice of such technologies is defined by the necessity to obtain corresponding optical characteristics of diffractive optical elements.

Keywords: diffractive optical elements, atomic force microscope, diffraction efficiency, surface-relief parameters.

Received: 11.03.2016
Revised: 14.04.2016

DOI: 10.18287/2412-6179-2016-40-2-215-224



© Steklov Math. Inst. of RAS, 2026